| 第 33 卷第 1 期 |  | Vol. 33 No. 1 | | 2003 年 2 月 | Feb 2003 |
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所屬欄目：專(zhuān)論與綜述
紫外光固化光敏齊聚物體系的研究進(jìn)展 |
| 周鋼; 陳建山; 奚海; 吳宇雄(中南林學(xué)院高分子材料與工程教研室; 湖南株洲; 412006) |
| 摘 要：介紹了近年來(lái)國內外紫外光固化體系的研究進(jìn)展。重點(diǎn)對第二代光敏齊聚物 -丙烯酸酯體系的制備過(guò)程、組分及對性能影響進(jìn)行介紹 ,探討了光固化體系氧干擾、星形超分枝聚合物等問(wèn)題。 |
| 關(guān)鍵詞：紫外光固化; 光敏齊聚物; 光敏樹(shù)脂; 光固化涂料; 研究進(jìn)展 |
| 中圖分類(lèi)號：TQ630.4 文獻標識碼：A 文章編號：1009-9212(2003)01-0005-03 |
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| Progress on UV-Curing Photosensitive Oligomer |
| ZHOU Gang; et al.（Polymer Material and Engineering Group; Central-South Forestry University; Zhuzhou; Hunan; 412006; China） |
| Abstract：Recent progress on UV-curing photosensitive oligomer was reviewed. The emphasis was put on the components and preparation of second phase photosensitive oligomer-acrylic resin and their effect on the resin. The oxidization, high-grafting star polymerization of photocuring resin were also discussed. |
| Key words：UV-curing; photosensitive oligomer; photosensitive resin; photocuring paint |
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收稿日期：2002-11-15
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